Temperature limit in ECH hot electron plasmas
نویسندگان
چکیده
منابع مشابه
Electron temperature of ultracold plasmas.
We study the evolution of ultracold plasmas by measuring the electron temperature. Shortly after plasma formation, competition between heating and cooling mechanisms drives the electron temperature to a value within a narrow range regardless of the initial energy imparted to the electrons. In agreement with theory predictions, plasmas exhibit values of the Coulomb coupling parameter Gamma less ...
متن کاملThe electron cyclotron maser in hot thermal plasmas
We investigate the possibility of an electron cyclotron maser operating in a hot (T > 107K) thermal plasma with a loss cone. We find that the instability can occur in this scenario because resonance involving electrons in the thermal tail can give rise to significantly large growth rates. We estimate the range of electron velocities that can be in resonance and show how this dictates the freque...
متن کاملHot Electron Production in Plasmas Illuminated by Intense Lasers¶
Recent experiments with petawatt laser plasmas revealed interesting and unpredictable phenomena [1, 2]. A large number of fast electrons with energies up to several tens of MeV were detected. The estimated energy of these electrons was up to 10% of the pump laser energy. On the other hand, the plasma temperature was of the order of hundreds of eV and was only weakly dependent on laser intensity...
متن کاملElectron-temperature evolution in expanding ultracold neutral plasmas.
We have used the free expansion of ultracold neutral plasmas as a time-resolved probe of electron temperature. A combination of experimental measurements of the ion expansion velocity and numerical simulations characterize the crossover from an elastic-collision regime at low initial Gamma(e), which is dominated by adiabatic cooling of the electrons, to the regime of high Gamma(e) in which inel...
متن کاملPattern-Dependent Charging in Plasmas: Electron Temperature Effects
The differential charging of high-aspect-ratio dense structures during plasma etching is studied by two-dimensional Monte Carlo simulations. Enhanced electron shadowing at large electron temperatures is found to reduce the electron current density to the bottom of narrow trenches, causing buildup of large charging potentials on dielectric surfaces. These potentials alter the local ion dynamics,...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Physics of Fluids
سال: 1982
ISSN: 0031-9171
DOI: 10.1063/1.863723